规格:

束流电压范围为: 20kV - 100kV

光刻胶的特征尺寸: <8nm (光刻精度)

500um区域拼接/叠加误差: 小于25nm

自动装载5卡盘气锁系统

NB5发展目标:

改进设计和组件以减少日常服务需求。

实现每年少于5%的机器故障停机时间。

提**性能

便于批量生产。

NB5系统将为进**步发展**偏转速度和进**步集成电子提供平台。

The nB4 is a generation ahead of the current competition and with its field-proven performance has gained acceptance in the market place. It has excellent stability and has demonstrated an average uptime of greater than 93%. NanoBeam now introduces the nB5 which has been developed to further reduce delivery times and service costs.

NB5 development aims:

Refine design and components to reduce routine service requirements.

Achieve a machine-fault-downtime of less than 5% annually.

Enhance performance

Facilitate volume production.

Specification:

Beam Voltage range        20kV - 100kV

Feature size on resist      <8nm

Stitching/overlay error    <25nm for 500um field

Automatic loading            5 chuck airlock system

The nB5 system will provide a platform for further development to high deflection speed and further integrated electronics.